DOE_Multi-Lines (Multi Lines)
LD Collimators & Diffractive Optics: Pattern-Generator
Diffractive Optical Element (DOE)
Description:
LD Collimators & Diffractive Optics: Beam-shaping-Optics
Beam shaping optics in terms of diffractive optics involve the use of precisely engineered microstructures to control and shape light beams for a variety of advanced applications, leveraging the principles of diffraction to achieve high precision and flexibility.
LD Collimators & Diffractive Optics: Pattern-Generator
Diffractive pattern generators have a wide range of applications. In laser systems, they are used for beam shaping, allowing the laser beam to form desired shapes such as lines, circles, or complex patterns, which are essential in material processing, medical surgery, and laser printing. They play a crucial role in holography, creating holograms for data storage, security features on credit cards and passports, and 3D imaging. In optical testing and metrology, these generators produce specific patterns for testing optical components, measuring surface topography, and aligning optical systems. They are also used in displays and projection systems, including projectors and augmented reality devices, to create high-resolution and complex images. Additionally, they enhance the performance of optical communication systems by precisely controlling light propagation.
This article refers to: DOE_Multi-Lines (Multi Lines) (LD Collimators & Diffractive Optics: Pattern-Generator ) - Multi Lines
| Pattern Size @ 100 mm Distance (@ Design Wavelength) | Pattern Angles (@ Design Wavelength) | ||||||||||
| DOE Item # | Description | Design Wavel. | a | b | c | d | α | β | γ | δ | Optimum Wavelength Range |
| FDE-R198 | 31 Lines, Square | 450 nm* | 72.8 mm | 51.5 mm | 1.7 mm | 51.5 mm | 40.0° | 28.9° | 0.96° | 28.9° | 425 – 490 nm |
| FDE-R213 | 11 Lines, Square | 635 nm* | 76.7 mm | 54.4 mm | 5.4 mm | 54.4 mm | 42.0° | 30.4° | 3.0° | 30.4° | 530 – 670 nm |
| FDE-R233 | 7 Lines, Square | 635 nm* | 54.0 mm | 38.2 mm | 6.4 mm | 38.2 mm | 30.2° | 21.6° | 3.6° | 21.6° | 530 – 670 nm |
| FDE-R250 | 5 Lines (Rectangular) | 660 nm* | 55.0 mm | 10.9 mm | 2.7 mm | 53.9 mm | 30.8° | 6.2° | 1.6° | 30.2° | 590 – 670 nm |
| FDE-R251 | 7 Lines (Rectangular) | 650 nm | 15.5 mm | 9.0 mm | 1.5 mm | 12.6 mm | 8.9° | 5.2° | 0.8° | 7.2° | 590 – 730 nm |
| FDE-R252 | 5 Lines (Square) | 635 nm* | 42.7 mm | 30.2 mm | 7.5 mm | 30.2 mm | 24.1° | 17.2° | 4.3° | 17.2° | 530 – 670 nm |
| FDE-R253 | 11 Lines (Square, Thin Lines) |
635 nm* | 76.4 mm | 54.0 mm | 5.4 mm | 54.0 mm | 41.8° | 30.2° | 3.0° | 30.2° | 530 – 670 nm |
| FDE-R254 | 25 Lines (Square) | 660 nm* | 68.4 mm | 48.3 mm | 2.0 mm | 48.3 mm | 37.7° | 27.2° | 1.1° | 27.2° | 530 – 670 nm |
| FDE-R255 | 65 Lines (Square, Central Line Thicker) |
660 nm* | 45.6 mm | 32.2 mm | 0.5 mm | 32.2 mm | 25.7° | 18.3° | 0.3° | 18.3° | 530 – 670 nm |
| FDE-R284 | 41 Lines (Rectangular) | 660 nm* | 133.4 mm | 104.0 mm | 2.6 mm | 78.0 mm | 67.4° | 54.9° | 1.4° | 42.6° | 600 – 700 nm |
| FDE-R348 | 10 Lines (Rectangular) | 650 nm* | 125.5 mm | 90.0 mm | 10.0 mm | 87.5 mm | 64.2° | 48.5° | 5.4° | 47.3° | 600 – 700 nm |
| FDE-R350 | 15 Lines (Rectangular) | 520 nm* | 65.5 mm | 42.1 mm | 3.0 mm | 50.2 mm | 36.3° | 23.8° | 1.7° | 28.2° | 480 – 550 nm |
| FDE-R381 | 11 Lines (Rectangular) | 850 nm* | 155.6 mm | 41.5 mm | 4.15 mm | 150 mm | 75.8° | 23.5° | 2.3° | 74.0° | 830 – 880 nm |
| FDE-R386 | 3 Lines (Rectangular) | 520 nm* | 50.7 mm | 8.0 mm | 4.0 mm | 50.0 mm | 28.4° | 4.6° | 2.3° | 28.1° | 490 – 550 nm |
| FDE-R387 | 5 Lines (Rectangular) | 520 nm* | 50.7 mm | 8.0 mm | 2.0 mm | 50.0 mm | 28.4° | 1.15° | 3.1° | 28.1° | 480 – 560 nm |
| FDE-R391 | 81 Lines (Rectangular) | 650 nm* | 156.0 mm | 128.8 mm | 1.6 mm | 93.6 mm | 75.9° | 63.9° | 0.8° | 50.2° | 600 – 700 nm |
| FDE-R392 | 3 Lines (Rectangular) | 660 nm* | 54.7 mm | 10.8 mm | 5.4 mm | 53.6 mm | 30.6° | 6.2° | 3.1° | 30.0° | 600 – 700 nm |
*Large-angle pattern that due to its symmetry properties is subject to geometrical distortion, if the DOE is used at laser wavelengths significantly different (Δλ > 50nm) from the design wavelength.
- Pattern-Generator
