DOE_Multi-Lines (Multi Lines)
LD Collimators & Diffractive Optics: Pattern-Generator
Diffractive Optical Element (DOE)
Description:
LD Collimators & Diffractive Optics: Beam-shaping-Optics
Beam shaping optics excel in applications that demand precise control of light for improved performance, efficiency, and accuracy. Their versatility and precision make them indispensable in diverse fields ranging from industrial processing and medical surgery to optical communication and scientific research.
LD Collimators & Diffractive Optics: Pattern-Generator
A diffractive pattern generator leverages the principles of diffraction and interference using specially designed optical elements to create and project specific light patterns for a wide range of scientific, industrial, and commercial applications.
This article refers to: DOE_Multi-Lines (Multi Lines) (LD Collimators & Diffractive Optics: Pattern-Generator ) - Multi Lines
| Pattern Size @ 100 mm Distance (@ Design Wavelength) | Pattern Angles (@ Design Wavelength) | ||||||||||
| DOE Item # | Description | Design Wavel. | a | b | c | d | α | β | γ | δ | Optimum Wavelength Range |
| FDE-R198 | 31 Lines, Square | 450 nm* | 72.8 mm | 51.5 mm | 1.7 mm | 51.5 mm | 40.0° | 28.9° | 0.96° | 28.9° | 425 – 490 nm |
| FDE-R213 | 11 Lines, Square | 635 nm* | 76.7 mm | 54.4 mm | 5.4 mm | 54.4 mm | 42.0° | 30.4° | 3.0° | 30.4° | 530 – 670 nm |
| FDE-R233 | 7 Lines, Square | 635 nm* | 54.0 mm | 38.2 mm | 6.4 mm | 38.2 mm | 30.2° | 21.6° | 3.6° | 21.6° | 530 – 670 nm |
| FDE-R250 | 5 Lines (Rectangular) | 660 nm* | 55.0 mm | 10.9 mm | 2.7 mm | 53.9 mm | 30.8° | 6.2° | 1.6° | 30.2° | 590 – 670 nm |
| FDE-R251 | 7 Lines (Rectangular) | 650 nm | 15.5 mm | 9.0 mm | 1.5 mm | 12.6 mm | 8.9° | 5.2° | 0.8° | 7.2° | 590 – 730 nm |
| FDE-R252 | 5 Lines (Square) | 635 nm* | 42.7 mm | 30.2 mm | 7.5 mm | 30.2 mm | 24.1° | 17.2° | 4.3° | 17.2° | 530 – 670 nm |
| FDE-R253 | 11 Lines (Square, Thin Lines) |
635 nm* | 76.4 mm | 54.0 mm | 5.4 mm | 54.0 mm | 41.8° | 30.2° | 3.0° | 30.2° | 530 – 670 nm |
| FDE-R254 | 25 Lines (Square) | 660 nm* | 68.4 mm | 48.3 mm | 2.0 mm | 48.3 mm | 37.7° | 27.2° | 1.1° | 27.2° | 530 – 670 nm |
| FDE-R255 | 65 Lines (Square, Central Line Thicker) |
660 nm* | 45.6 mm | 32.2 mm | 0.5 mm | 32.2 mm | 25.7° | 18.3° | 0.3° | 18.3° | 530 – 670 nm |
| FDE-R284 | 41 Lines (Rectangular) | 660 nm* | 133.4 mm | 104.0 mm | 2.6 mm | 78.0 mm | 67.4° | 54.9° | 1.4° | 42.6° | 600 – 700 nm |
| FDE-R348 | 10 Lines (Rectangular) | 650 nm* | 125.5 mm | 90.0 mm | 10.0 mm | 87.5 mm | 64.2° | 48.5° | 5.4° | 47.3° | 600 – 700 nm |
| FDE-R350 | 15 Lines (Rectangular) | 520 nm* | 65.5 mm | 42.1 mm | 3.0 mm | 50.2 mm | 36.3° | 23.8° | 1.7° | 28.2° | 480 – 550 nm |
| FDE-R381 | 11 Lines (Rectangular) | 850 nm* | 155.6 mm | 41.5 mm | 4.15 mm | 150 mm | 75.8° | 23.5° | 2.3° | 74.0° | 830 – 880 nm |
| FDE-R386 | 3 Lines (Rectangular) | 520 nm* | 50.7 mm | 8.0 mm | 4.0 mm | 50.0 mm | 28.4° | 4.6° | 2.3° | 28.1° | 490 – 550 nm |
| FDE-R387 | 5 Lines (Rectangular) | 520 nm* | 50.7 mm | 8.0 mm | 2.0 mm | 50.0 mm | 28.4° | 1.15° | 3.1° | 28.1° | 480 – 560 nm |
| FDE-R391 | 81 Lines (Rectangular) | 650 nm* | 156.0 mm | 128.8 mm | 1.6 mm | 93.6 mm | 75.9° | 63.9° | 0.8° | 50.2° | 600 – 700 nm |
| FDE-R392 | 3 Lines (Rectangular) | 660 nm* | 54.7 mm | 10.8 mm | 5.4 mm | 53.6 mm | 30.6° | 6.2° | 3.1° | 30.0° | 600 – 700 nm |
*Large-angle pattern that due to its symmetry properties is subject to geometrical distortion, if the DOE is used at laser wavelengths significantly different (Δλ > 50nm) from the design wavelength.
- Pattern-Generator
